Nanoimprint Technology

• HIRAI Yoshihiko

  Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University

Bibliographic Information

Other Title

• ナノインプリント技術
• ナノインプリント ギジュツ

Abstract

Nanoimprint lithography is one of the promising technologies for ultra integration systems. This paper introduces some basic issues of this technology such as polymer deformation mechanisms, mold fabrication and it's surface treatment. Also, fabrication of high aspect rate nano structure, curved structures, bio-devices and 3-dimensional multilayered structure are demonstrated.

Journal

• Journal of Printing Science and Technology

  Journal of Printing Science and Technology 41 (4), 200-210, 2004

  The Japanese Society of Printing Science and Technology

Details

• CRID: 1390282679065310208
• NII Article ID: 130004513583
• NII Article ID: 10013536782
• NII Book ID: AN10161648
• DOI: 10.11413/nig.41.200
• COI: 1:CAS:528:DC%2BD2cXosl2gtrw%3D
• ISSN: 18824935
• ISSN: 09143319
• NDL BIB ID: 7064501
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7064501
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • CiNii Articles
• Abstract License Flag: Disallowed