Enhancement of Critical Current Density in ErBa2Cu3Oy Thin Films by Post-Annealing

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著者

    • Matsumoto Kaname
    • Department of Materials Science and Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
    • Ohazama Tohru
    • Department of Electrical and Information Engineering, Yamagata University, Yonezawa, Yamagata 992-8510, Japan
    • Yoshida Yutaka
    • Department of Energy and Science, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
    • Shimoyama Jun-ichi
    • Department of Superconductivity, Univerity of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
    • Kishio Kohji
    • Department of Superconductivity, Univerity of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

抄録

We report a remarkable increase in critical current density ($J_{\text{c}}$) by oxygen post-annealing for only a few tens of minutes in ErBa2Cu3Oy films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The $J_{\text{c}}$ of these films were obviously enhanced to more than 1 MA$\cdot$cm-2 in the annealing temperature range of 350°C–500°C in comparison with those of the as-deposited films (0.3–0.5 MA$\cdot$cm-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa2Cu3Oy coated conductors.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters

    Japanese journal of applied physics. Pt. 2, Letters 43(9A/B), L1223-L1225, 2004-09-15

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10013573023
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7079721
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  CJP引用  NDL  JSAP 
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