Spin-polarized Tunneling in Ultrasmall Vertical Ferromagnetic Tunnel Junctions

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著者

    • Haraichi Satoshi Haraichi Satoshi
    • Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
    • Wada Toshimi Wada Toshimi
    • Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
    • Ishii Kenichi [他] Ishii Kenichi
    • Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
    • Hikosaka Kazunori
    • Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

抄録

We have developed nanometer-scale vertical ferromagnetic tunnel junctions using a Si-based inorganic electron beam resist process, including barrier layer fabrication using metal evaporation in ozone atmosphere. The current–voltage ($I$–$V$) characteristics of Ni/NiO/Co multiple junctions with diameters of 20 nm have been measured in a magnetic field to investigate spin-polarized tunneling in the Coulomb blockade regime. The temperature dependence of the $I$–$V$ curve indicates that Coulomb blockade phenomena occur at temperatures below 40 K, agreeing with the estimation of the single-electron charging energy from the device geometries. The magnetoresistance is strongly enhanced by magnetization reversal of Ni and Co, and the obtained MR ratio is greater than 100% in the Coulomb blockade regime at 15 K.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 43(9A), 6061-6064, 2004-09-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10013573455
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7079319
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  J-STAGE  JSAP 
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