Enhancing the Overwriting Characteristics of Phase-Change Optical Disks by Doping in Dielectric Layers

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著者

    • Yu Chien-Hui Yu Chien-Hui
    • Department of Materials Science and Engineering, National Chiao-Tung University, 1001, Ta-Hsueh Rd., Hsinchu 30010, Taiwan, R.O.C.
    • Yeh Tung-Ti [他] Yeh Tung-Ti
    • Department of Materials Science and Engineering, National Chiao-Tung University, 1001, Ta-Hsueh Rd., Hsinchu 30010, Taiwan, R.O.C.
    • Shieh Han-Ping D.
    • Institute of Electro-Optical Engineering, National Chiao-Tung University, 1001, Ta-Hsueh Rd., Hsinchu 30010, Taiwan, R.O.C.

抄録

In this work, we studied the enhancement of overwriting characteristics of phase-change optical disks by doping in the dielectric layers. The doping elements included chromium (Cr), molybdenum (Mo), nickel (Ni), tantalum (Ta), titanium (Ti), tungsten (W), vanadium (V), and nitrogen (N2). Dynamic test showed that doping with a certain amount of W and N2 in dielectric layers enhanced the disk overwriting characteristics. Up to fortyfold improvement in disk cycleability was observed when N2 gas was introduced during sputtering deposition of the upper dielectric layer at the gas flow rate of $\text{N$_{2}$/Ar}=25$%. Tungsten was the best among the doping metallic elements resulting in fivefold improvement in disk cycleability. Optical property measurement revealed that the refractive index ($n$) decreased with increasing N2 doping percentage, while the relatively small amount of metallic element doping negligibly changed the optical constants. Subsequent modulation simulation showed that such an optical property change is beneficial to disk overwriting characteristics. Nanoindentation test showed that N2 doping was the most effective method for increasing the hardness of the dielectric layer. This implies that, with increasing mechanical strength, the dielectric layer possesses better resistance to thermal deformation resulting from laser heating, thereby enhancing the cycleability of optical disks.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 43(9A), 6129-6133, 2004-09-15

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10013573706
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7079532
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  J-STAGE  JSAP 
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