Effect of Annealing on the Tolerance of LiCaAlF<sub>6</sub> Single Crystals against F<sub>2</sub> Laser Irradiation

DOI Web Site Web Site 参考文献24件
  • Kawaguchi Yoshizo
    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
  • Narazaki Aiko
    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
  • Sato Tadatake
    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
  • Kurosaki Ryozo
    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
  • Niino Hiroyuki
    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
  • Sato Hiroki
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
  • Fukuda Tsuguo
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

書誌事項

タイトル別名
  • Effect of Annealing on the Tolerance of LiCaAlF6 Single Crystals against F2 Laser Irradiation

この論文をさがす

抄録

The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF6 (t=1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ cm−2 pulse−1.

収録刊行物

参考文献 (24)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ