Effect of Annealing on the Tolerance of LiCaAlF6 Single Crystals against F2 Laser Irradiation

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著者

    • Kawaguchi Yoshizo
    • Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Narazaki Aiko
    • Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Sato Tadatake
    • Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Kurosaki Ryozo
    • Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Niino Hiroyuki
    • Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Sato Hiroki
    • Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
    • Fukuda Tsuguo
    • Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

抄録

The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF6 ($t=1.45$ mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to $10^{5}$ pulses at a fluence of approximately 160 mJ cm-2 pulse-1.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 43(9A), 6168-6169, 2004-09-15

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10013573820
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • データ提供元
    CJP書誌  J-STAGE  JSAP 
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