A New Spectral Imaging Ellipsometer for Measuring the Thickness of Patterned Thin Films

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著者

    • Chegal Won
    • Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
    • Cho Yong Jai
    • Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
    • Kim Hyun Jong
    • Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
    • Cho Hyun Mo
    • Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, South Korea
    • Lee Yun Woo
    • Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
    • Kim Soo Hyun
    • Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, South Korea

抄録

We proposed spectral imaging ellipsometry that uniquely combines one-dimensional imaging and spectroscopic ellipsometry. This type of ellipsometry enables the measurement of the optical parameters and dimensional structures of patterned or multilayered thin films. We demonstrated the result of the measurement of the thickness of patterned SiO2 layers with 3 nm accuracy and 200 μm spatial resolution.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 43(9A), 6475-6476, 2004-09-15

    INSTITUTE OF PURE AND APPLIED PHYSICS

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各種コード

  • NII論文ID(NAID)
    10013574863
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • データ提供元
    CJP書誌  J-STAGE  JSAP 
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