Ultrathin Silica Films with a Nanoporous Monolayer

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著者

    • TANAKA Shunsuke
    • Division of Chemical Engineering, Graduate School of Engineering Science, Osaka University
    • NISHIYAMA Norikazu
    • Division of Chemical Engineering, Graduate School of Engineering Science, Osaka University
    • EGASHIRA Yasuyuki
    • Division of Chemical Engineering, Graduate School of Engineering Science, Osaka University
    • UEYAMA Korekazu
    • Division of Chemical Engineering, Graduate School of Engineering Science, Osaka University

抄録

Ultrathin silica films with a monolayer of uniform nanopores were fabricated on a silicon substrate by contacting triblock copolymer films with tetraethoxysilane vapor followed by calcination to remove the copolymer.

Ultrathin silica films with a monolayer of uniform nanopores were fabricated on a silicon substrate by contacting triblock copolymer films with tetraethoxysilane vapor followed by calcination to remove the copolymer.

収録刊行物

  • Chemistry letters

    Chemistry letters 33(11), 1408-1409, 2004-11-05

    公益社団法人 日本化学会

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各種コード

  • NII論文ID(NAID)
    10013771438
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    SHO
  • ISSN
    03667022
  • データ提供元
    CJP書誌  IR  J-STAGE 
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