Ultrathin Silica Films with a Nanoporous Monolayer

• Tanaka, Shunsuke

• Nishiyama, Norikazu

• Hayashi, Yasushi

• Egashira, Yasuyuki

• Ueyama, Korekazu

抄録

Ultrathin silica films with a monolayer of uniform nanopores were fabricated on a silicon substrate by contacting triblock copolymer films with tetraethoxysilane vapor followed by calcination to remove the copolymer.

収録刊行物

• Chemistry Letters

  Chemistry Letters 33 (11), 1408-1409, 2004-07-13

  The Chemical Society of Japan

キーワード

• General Chemistry

詳細情報

• CRID: 1050001202913748864
• NII論文ID: 10013771438
• NII書誌ID: AA00603318
• ISSN: 03667022
• ISSN: 13480715
• DOI: 10.1246/cl.2004.1408
• HANDLE: 10112/5620
• Web Site: https://kansai-u.repo.nii.ac.jp/records/11271
• Web Site: https://academic.oup.com/chemlett/article-pdf/33/11/1408/55584113/cl.2004.1408.pdf
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
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