Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition at Subatmospheric Pressure

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The deposition of diamond-like carbon (DLC) films at subatmospheric pressure has been achieved by the nanopulse plasma chemical vapor deposition (CVD) method. To realize this process, a high ion density and non-arcing plasma at subatmospheric pressure are required. A static induction (SI) thyristor with an inductive energy storage (IES) circuit was used. The DLC film was obtained under the conventional low-pressure process at 6 Pa, and the characteristics of the high electron temperature and the exponential relationship between pulse frequency and growth rate were observed. Deposition of the DLC film was also achieved at the subatmospheric pressure of 26.7 kPa (200 Torr) using this nanopulse plasma CVD method.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters

    Japanese journal of applied physics. Pt. 2, Letters 43(11A), L1406-L1408, 2004-11-01

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10013787265
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7146677
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE  JSAP 
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