A Simple Method for Fabrication of Mesoporous Films Using a Rapid Heating Process

DOI PDF 被引用文献1件 参考文献38件
  • Takeo Yamada
    Energy Electronics Institute, National Institute of Advanced Industrial Science and Technology (AIST)
  • Haoshen Zhou
    Energy Electronics Institute, National Institute of Advanced Industrial Science and Technology (AIST)
  • Itaru Honma
    Energy Electronics Institute, National Institute of Advanced Industrial Science and Technology (AIST)
  • Yuko Ueno
    NTT Microsystem Integration Laboratories
  • Tsutomu Horiuchi
    NTT Microsystem Integration Laboratories
  • Osamu Niwa
    NTT Microsystem Integration Laboratories

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<jats:title>Abstract</jats:title> <jats:p>Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.</jats:p>

収録刊行物

  • Chemistry Letters

    Chemistry Letters 34 (3), 328-329, 2005-02-05

    Oxford University Press (OUP)

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