Growth Control of Carbon Nanotube using Various Applied Electric Fields for Electronic Device Applications
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- Maeda Masatoshi
- University of Tsukuba CREST/JST
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- Hyon Chan-Kyeong
- CREST/JST
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- Kamimura Takafumi
- Osaka University CREST/JST
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- Kojima Atsuhiko
- CREST/JST
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- Sakamoto Kazue
- Meiji University
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- Matsumoto Kazuhiko
- Osaka University CREST/JST
Bibliographic Information
- Other Title
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- Growth Control of Carbon Nanotube using Various Applied Electric Field-Effect Transistors
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Abstract
The control of the growth direction of a carbon nanotube was accomplished by applying an electric field during the growth of the carbon nanotube. The effects of two types of applied bias, one is a constant DC bias, and the other is a ramp bias, on the control of the growth direction were examined. By maintaining a constant DC bias we could control the growth direction of the carbon nanotube, however, the bridging ratio between the two electrodes was as small as 35%. We suppose that this low bridging ratio may be caused by the etching effect of hydrogen. When a ramp bias was applied, bridging ratio tended to increase with the slope of ramp bias. Under optimal conditions, the bridging ratio reached a value as high as 95%.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (4A), 1585-1587, 2005
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681240990208
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- NII Article ID
- 10015469647
- 130004533581
- 210000057540
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 7302099
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed