New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator

• Watanabe Yasufumi

  Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

• Shibasaki Yuji

  Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

• Ando Shinji

  Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

• Ueda Mitsuru

  Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

抄録

A new negative-working and alkaline-developable photosensitive polyimide precursor based on semi-aromatic poly(amic acid)s (4), 4,4′-methylenebis[2,6-bis(hydroxymethyl)]phenol (MBHP) as a cross-linker, and a photoacid generator (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-2-(methylphenyl)acetonitrile (PTMA) has been developed. Novel polymers 4 were prepared by ring-opening polyadditions of alicyclic dianhydrides (1), 1,2,3,4-cyclobutanetetracarboxylic dianhydride (1a), bicyclo[2.2.2]oct-7-ene-2,3;5,6-tetracarboxylic dianhydride (1b), and bicyclo[2.2.1]heptane-2-methanecarboxylic-3,5,6-tricarboxylic-2,3:5,6-dianhydride (1c) with 1,3-bis(4-aminophenoxy)adamantane (3). Polymers 4 were converted to corresponding poly(imide)s (5) by thermal treatment. The dielectric constants (ε) of 5 estimated from the refractive indices were 2.72–2.74. The photosensitive polyimide precursor containing 4 (60 wt %), MBHP (30 wt %), and PTMA (10 wt %) cast from 2-methoxyethanol solution showed a clear negative image featuring 15 μm line and space patterns when it was exposed to 436 nm light, post-exposure baked at 110 °C for 3 min, followed by developing with 2.38 wt % aqueous tetramethylammonium hydroxide (TMAH) solution at 25 °C for 40 s.

収録刊行物

• Polymer Journal

  Polymer Journal 37 (4), 270-276, 2005

  The Society of Polymer Science, Japan

キーワード

• Polyimides
• Alkaline Developer
• Photosensitive Polymer
• Refractive Indices
• Low Dielectric Constants
• Alicyclic

詳細情報

• CRID: 1390282681266467200
• NII論文ID: 10015532969
• NII書誌ID: AA00777013
• DOI: 10.1295/polymj.37.270
• COI: 1:CAS:528:DC%2BD2MXjs12ls7c%3D
• ISSN: 13490540
• ISSN: 00323896
• NDL書誌ID: 7299043
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7299043
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
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