Epitaxial Growth Map for Bi4Ti3O12 Films: a Determining Factor for Crystal Orientation

• Watanabe Takayuki

  Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology

• Funakubo Hiroshi

  Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology PRESTO, Japan Science and Technology Corporation (JST)

Bibliographic Information

Other Title

• Epitaxial Growth Map for Bi₄Ti₃O₁₂ Films: a Determining Factor for Crystal Orientation

Abstract

Bi₄Ti₃O₁₂ films were epitaxially grown at 600–750°C on various types of single-crystal oxide substrate by metal-organic chemical vapor deposition. In terms of the oxygen interatomic distances of the substrates used, the crystal orientations of the deposited epitaxial films were classified into three groups: (118), in-plane c-axis, and (001) orientations. The films on substrates with an oblong in-plane oxygen unit, had a (100)/(010) and/or (118) orientation, wheras those on substrates with a square in-plane oxygen unit had (001) or (hk0)⁄(kh0) orientation. There was an intermediate region between the (100)/(010) and (118) orientations at the present deposition temperature, where both orientations coexisted. As a result, the relationship between in-plane oxygen interatomic distances of the substrates and film orientation was summarized into an epitaxial growth map. This map is applicable to the epitaxial growth of other bismuth-layer-structured ferroelectric thin films.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 44 (3), 1337-1343, 2005

  The Japan Society of Applied Physics

Keywords

• MOCVD
• bismuth-layer-structured ferroelectrics
• Bi<SUB>4</SUB>Ti<SUB>3</SUB>O<SUB>12</SUB>
• epitaxial growth
• oxygen interatomic distance
• epitaxial growth map

Details

• CRID: 1390282681243044480
• NII Article ID: 210000057479
• NII Article ID: 10015594918
• NII Article ID: 130004533513
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.44.1337
• ISSN: 13474065
• ISSN: 00214922
• NDL BIB ID: 7288532
• Web Site: http://id.ndl.go.jp/bib/7288532
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7288532
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.1337
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.1337/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed