Structural and Electrical Characteristics of HfO_2 Films Fabricated by Pulsed Laser Deposition

  • IKEDA Hiroya
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
  • GOTO Satoru
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
  • HONDA Kazutaka
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
  • SAKASHITA Mitsuo
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
  • SAKAI Akira
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
  • ZAIMA Shigeaki
    Center for Cooperative Research in Advanced Science and Technology, Nagoya University
  • YASUDA Yukio
    Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

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詳細情報 詳細情報について

  • CRID
    1570291225232565248
  • NII論文ID
    10015753533
  • NII書誌ID
    AA10777858
  • 本文言語コード
    en
  • データソース種別
    • CiNii Articles

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