-
- Takeda Satoshi
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Ishino Kenei
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Inoue Yoku
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Ishida Akihiro
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Fujiyasu Hiroshi
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Kominami Hiroko
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Mimura Hidenori
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Nakanishi Yoichiro
- Department of Electrical and Electronic Engineering, Shizuoka University
-
- Sakakibara Shingo
- Yamaha Corporation
この論文をさがす
抄録
We have characterized the growth of GaN nanostructures on Si (111). Hexagonal faceted pillarlike GaN nanostructures (GaN nanopillars) were grown by hot wall epitaxy. The GaN nanopillars were self-assembled. Scanning electron microscopy and atomic force microscopy were used to characterize the samples. The typical diameter of the GaN nanopillars was 200 nm. It was found that GaN nanopillars are grown only on a low-temperature GaN island buffer layer. By changing the annealing temperature of the buffer layer, the density of the GaN nanopillars was controlled from 0.4×108 to 3.5×108 cm−2.
収録刊行物
-
- Japanese Journal of Applied Physics
-
Japanese Journal of Applied Physics 44 (7B), 5664-5666, 2005
The Japan Society of Applied Physics
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001206265181824
-
- NII論文ID
- 10016677734
- 210000058514
- 130004534423
-
- NII書誌ID
- AA10457675
-
- ISSN
- 13474065
- 00214922
-
- NDL書誌ID
- 7379076
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
-
- 抄録ライセンスフラグ
- 使用不可