Characteristics of Xenon Capillary Z-Pinch Extreme Ultraviolet Lithography Source Driven by Different dI/dt Discharge Current Pulses
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- Song Inho SONG Inho
- Department of Energy Sciences, Tokyo Institute of Technology
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- Iwata Kazuhiro IWATA Kazuhiro
- Department of Energy Sciences, Tokyo Institute of Technology
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- Homma Yusuke [他] HOMMA Yusuke
- Department of Energy Sciences, Tokyo Institute of Technology
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- MOHANTY Smruti Ranjan
- Centre of Plasma Physics, Sonapur
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- WATANABE Masato
- Department of Energy Sciences, Tokyo Institute of Technology
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- KAWAMURA Toru
- Department of Energy Sciences, Tokyo Institute of Technology
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- OKINO Akitoshi
- Department of Energy Sciences, Tokyo Institute of Technology
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- YASUOKA Koichi
- Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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- HORIOKA Kazuhiko
- Department of Energy Sciences, Tokyo Institute of Technology
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- HOTTA Eiki
- Department of Energy Sciences, Tokyo Institute of Technology
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Author(s)
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- Song Inho SONG Inho
- Department of Energy Sciences, Tokyo Institute of Technology
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- Iwata Kazuhiro IWATA Kazuhiro
- Department of Energy Sciences, Tokyo Institute of Technology
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- Homma Yusuke [他] HOMMA Yusuke
- Department of Energy Sciences, Tokyo Institute of Technology
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- MOHANTY Smruti Ranjan
- Centre of Plasma Physics, Sonapur
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- WATANABE Masato
- Department of Energy Sciences, Tokyo Institute of Technology
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- KAWAMURA Toru
- Department of Energy Sciences, Tokyo Institute of Technology
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- OKINO Akitoshi
- Department of Energy Sciences, Tokyo Institute of Technology
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- YASUOKA Koichi
- Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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- HORIOKA Kazuhiko
- Department of Energy Sciences, Tokyo Institute of Technology
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- HOTTA Eiki
- Department of Energy Sciences, Tokyo Institute of Technology
Journal
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- Japanese journal of applied physics Pt. 1 Regular papers, brief communications & review papers
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Japanese journal of applied physics Pt. 1 Regular papers, brief communications & review papers 44(12), 8640-8645, 2005-12-30
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
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- Plasma Efficiency of Pulse Power based Extreme-Ultra-Violet (EUV) Radiation Sources [in Japanese]
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HORIOKA Kazuhiko , SHIHO Makoto , HOTTA Eiki , KAWAMURA Tohru , NAKAJIMA Mitsuo , MASNAVI Majid , KIKUCHI Atsushi , TAKAHASHI Kensaku
電気学会研究会資料. PPT, パルスパワー研究会 2006(1), 73-76, 2006-02-06
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