Study of Spatial Distribution of SiH3 Radicals in Very High Frequency Plasma Using Cavity Ringdown Spectroscopy

• Takehiko Nagai

• Arno H. M. Smets

• Michio Kondo

Bibliographic Information

Other Title

• Special Issue: Plasma Processing
• Special Issue Plasma Processing

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 45 (10B), 8095-8098, 2006-10

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Keywords

• μc-Si:H
• SiH3 radical

Details

• CRID: 1520290883203753344
• NII Article ID: 10018338931
• NII Book ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.45.8095
• NDL BIB ID: 8519964
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8519964
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.45.8095
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.45.8095/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles