Analysis of Developing Behavior in Two-Component Development System by Large-Scale Discrete Element Method

• Mio Hiroshi

  Kyoto Fine Particle Technology, Keihanna Interaction Plaza Inc. Research Center for Advanced Science and Technology, Doshisha University

• Matsuoka Yoshihiro

  Department of Chemical Engineering and Materials Science, Doshisha University

• Shimosaka Atsuko

  Department of Chemical Engineering and Materials Science, Doshisha University

• Shirakawa Yoshiyuki

  Department of Chemical Engineering and Materials Science, Doshisha University

• Hidaka Jusuke

  Department of Chemical Engineering and Materials Science, Doshisha University

Bibliographic Information

Other Title

• Analysis of Developin Behavior in Two Component Development System by Large Scale Discrete Element Method

Abstract

The developing behavior of toners (maximum 150000 particles) in a two-component development system was simulated to find out the correlation between experimental results and simulated ones by using the large-scale Discrete Element Method (DEM). The effect of bias voltage, development gap or circumferential speed of a photoreceptor on the developed toner mass per area (DMA) was discussed both in experimental and simulation works. DMA increased with increasing offset voltage due to an increase in the development field, and it decreased with increasing the development gap because of the weakening of the electric field or reduction of a development nip. It also decreased with increasing circumferential speed of the photoreceptor, because the toners had less chances to contact the latent image, and the image was damaged by the magnetic brush under the high speed. The similar tendency was observed both in experimental and simulation works, and the simulation results correlates with experimental ones. Therefore, this simulation method is useful for the analysis of the developing behavior in electrophotographic system and the optimization or designing of this system will be possible.

Journal

• JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

  JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 39 (11), 1137-1144, 2006

  The Society of Chemical Engineers, Japan

Keywords

• Electrophotography
• Two-Component Development System
• Discrete Element Method
• Large-Computing
• Developing Behavior

Details

• CRID: 1390282679544269440
• NII Article ID: 10018401582
• NII Book ID: AA00709658
• DOI: 10.1252/jcej.39.1137
• COI: 1:CAS:528:DC%2BD2sXjsFWlsw%3D%3D
• ISSN: 18811299
• ISSN: 00219592
• NDL BIB ID: 8553518
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8553518
• Web Site: http://www.jstage.jst.go.jp/article/jcej/39/11/39_11_1137/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed