Soft X-Ray Absorption and Emission Study of Silicon Oxynitride/Si(100) Interface

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Author(s)

Journal

  • Japanese journal of applied physics Pt. 2 Letters & express letters

    Japanese journal of applied physics Pt. 2 Letters & express letters 46(1), L77-L79, 2007-01-25

    Japan Society of Applied Physics

References:  18

Codes

  • NII Article ID (NAID)
    10018495657
  • NII NACSIS-CAT ID (NCID)
    AA10650595
  • Text Lang
    ENG
  • Article Type
    SHO
  • ISSN
    00214922
  • NDL Article ID
    8621524
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z54-J337
  • Data Source
    CJP  NDL 
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