Scalability of Ni FUSI gate processes : phase and Vt control to 30 nm gate lengths
Journal
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- VLSI Tech. Dig., 2005
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VLSI Tech. Dig., 2005 2005
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Details 詳細情報について
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- CRID
- 1570291225407004160
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- NII Article ID
- 10018897119
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- Data Source
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- CiNii Articles