Suppression of self-heating in low-temperature polycrystalline silicon thin-film transistors

• Shinichiro Hashimoto

• Yukiharu Uraoka

• Takashi Fuyuki

Bibliographic Information

Other Title

• Suppression of self heating in low temperature polycrystalline silicon thin film transistors

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4A), 1387-1391, 2007-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Keywords

• low-temperature poly-Si
• thin-film transistor
• thermal degradation
• reliability
• power

Details

• CRID: 1520290884123859712
• NII Article ID: 10018900308
• NII Book ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.1387
• NDL BIB ID: 8705778
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8705778
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1387
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1387/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles