Numerical Analysis for Improvement of Discharge Property in Ring Dielectric Line Surface Wave Plasma Processing Device

• NAKAGAWA Takashi

  The University of Tokyo

• KIM Jaeho

  The University of Tokyo

• KATSURAI Makoto

  The University of Tokyo

Bibliographic Information

Other Title

• 円形表面波プラズマ装置の放電特性の向上に関する数値解析

Journal

• 電気学会研究会資料. PST, プラズマ研究会

  電気学会研究会資料. PST, プラズマ研究会 2001 (81), 27-32, 2001-12-07

Keywords

• Surface Wave Plasma
• Process Plasma
• Argon Plasma
• FDTD method
• MHD Equations

Details

• CRID: 1570572700438821120
• NII Article ID: 10018980751
• NII Book ID: AA11501025
• Text Lang: ja
• Data Source:
  • CiNii Articles