Axial Profile of Charged Particles in Ar/CF_4 RF CCP Plasmas

• OHE K.

  Department of Systems Engineering, Nagoya Institute of Technology

• KIMURA T.

  Department of Systems Engineering, Nagoya Institute of Technology

• KAGA K.

  Department of Systems Engineering, Nagoya Institute of Technology

Journal

• 電気学会研究会資料. PST, プラズマ研究会

  電気学会研究会資料. PST, プラズマ研究会 2001 (1), 63-66, 2001-04-19

Details

• CRID: 1570572700438975104
• NII Article ID: 10018981513
• NII Book ID: AA11501025
• Text Lang: en
• Data Source:
  • CiNii Articles