Deposition of a-C:F films by C_8F_<18> plasma CVD and their properties

• OHTA Akitsugu

  Hokkaido University

• BILOIU Costel

  West Virginia University

• SAKAI Yosuke

  Hokkaido University

• BRATESCU Maria-Antoaneta

  Hokkaido University

• SUDA Yosiyuki

  Hokkaido University

Bibliographic Information

Other Title

• C_8F_<18>プラズマCVDを用いたa-C:F膜の生成とその特性の評価

Journal

• 電気学会研究会資料. ED, 放電研究会

  電気学会研究会資料. ED, 放電研究会 2003 (107), 49-54, 2003-08-05

Keywords

• plasma enhanced chemical vapor deposition
• perfluorooctane vapor
• amorphous fluorocarbon polymer film dielectric constant
• leakage current
• breakdown voltage

Details

• CRID: 1571980075322403328
• NII Article ID: 10018985552
• NII Book ID: AN10320559
• Text Lang: ja
• Data Source:
  • CiNii Articles
  • KAKEN