Mo Thin Film Prepared by Capacitively Coupled Neutral Loop discharge Sputter System and its Plasma Characteristics

• OKRAKU-YIRENKY Y.

  Miyazaki University

• NAKAMURA Y.

  Miyazaki University

• SUNG Y. M.

  Miyazaki University

• OTSUBO M

  Miyazaki University

• HONDA C.

  Miyazaki University

Journal

• 電気学会研究会資料. ED, 放電研究会

  電気学会研究会資料. ED, 放電研究会 2002 (1), 89-93, 2002-01-31

Keywords

• Neutral Loop Discharge (NLD) plasma
• Capacitively Coupled NLD
• Sputtering
• Electron Behavior
• Magnetic Null Field
• Mo Thin Film

Details

• CRID: 1570854175416025088
• NII Article ID: 10018987019
• NII Book ID: AN10320559
• Text Lang: en
• Data Source:
  • CiNii Articles