Smart plasma process

• HORI Masaru

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University

Bibliographic Information

Other Title

• スマートプラズマプロセス

Abstract

Plasma processes are the key technology in realizing the ultrafine fabrication and formation of highly functional thin films. So far, the development of plasma processes has been carried out by trial and error because the state inside the plasma is unknown, like a black box. Recently, diagnostics technology for measuring the gas phase and film surface has been developed. The smart plasma process is proposed, wherein the plasma is precisely controlled on the basis of plasma science. In this article, the evolution and scope of the smart plasma process is reviewed. Furthermore, a new technology and production on equipment which incorporates it, by which a highly precise plasma process with no fluctuation at a nanoscale size can be guaranteed, will be introduced.

Journal

• Oyo Buturi

  Oyo Buturi 74 (10), 1328-1335, 2005-10-10

  The Japan Society of Applied Physics

Keywords

• plasma process
• nano-process
• radical
• diagnostics
• etching
• deposition
• sensor
• subsurface

Details

• CRID: 1390564227310591744
• NII Article ID: 10019349239
• NII Book ID: AN00026679
• DOI: 10.11470/oubutsu.74.10_1328
• ISSN: 21882290
• ISSN: 03698009
• NDL BIB ID: 7684736
• Web Site: http://id.ndl.go.jp/bib/7684736
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7684736
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed