X線光電子回折の現状と将来  [in Japanese] Present and future of X-ray photoelectron diffraction  [in Japanese]

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Author(s)

    • 二瓶 好正 NIHEI Yoshimasa
    • 東京理科大学理工学部工業化学科 Department of Industrial Chemistry, Faculty of Pure and Applied Science, Tokyo University of Science
    • 野島 雅 NOJIMA Masashi
    • 東京理科大学理工学部工業化学科 Department of Industrial Chemistry, Faculty of Pure and Applied Science, Tokyo University of Science

Abstract

<p>X線光電子回折の発展の経過を主な論文をあげつつ概観した.また,原理,装置などについても略述し,現象と方法の主な特徴と得られる情報についてもまとめた.本方法の現状について述べるとともに,最近の研究動向と主な応用例をあげ,さらには,近い将来の発展の方向について述べた.</p>

<p>The steps in the development of X-ray photoelectron diffraction are briefly reviewed by introducing examples of important papers. The discipline and the instrumentation of this method are also described by focusing on stressing the features and the information obtained by the method. The recent trends in the application and the future direction of X-ray photoelectron diffraction are discussed.</p>

Journal

  • Oyo Buturi

    Oyo Buturi 74(10), 1341-1344, 2005-10-10

    The Japan Society of Applied Physics

References:  36

Codes

  • NII Article ID (NAID)
    10019349293
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    03698009
  • NDL Article ID
    7684789
  • NDL Source Classification
    ZM17(科学技術--科学技術一般--力学・応用力学)
  • NDL Call No.
    Z15-243
  • Data Source
    CJP  NDL  J-STAGE 
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