Proposal and Technical Consideration of Polishing on Inner Capillary Wall Utilizing Magnetic Responsive Functional Fluid

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  • 磁気機能性流体による細管内面研磨の提案と技術的検討
  • ジキ キノウセイ リュウタイ ニ ヨル サイカン ナイメン ケンマ ノ テイアン ト ギジュツテキ ケントウ

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Abstract

This report describes the technical proposal as the first step on the polishing of inner capillary wall utilizing a magnetic compound fluid (MCF) combined by a magnetic fluid and magneto-rheological fluid. When perform the proposed polish, we flow in MCF included nonmagnetic abrasive to nonmagnetic inside a capillary and impress a rotation magnetic field with three-phase alternating current to vertical direction of capillary axis. We performed polishing experiments for a stainless steel capillary of 2mm inside diameter and investigated the influence of abrasive density and magnetic density. Although the polishing effect is lower but the vanishing action is showed. To understand the polish mechanism we have done visible experiment and magnetic field analysis, and investigated the abrasive behavior. We found the abrasive always gather to a place where magnetic field strength is small such as pushed out from the cluster and the abrasive do relative rotation motion. From the results, we consider distribution of clusters gave the abrasive processing force and magnetic field is important in this type of polish.

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