Photoinduced Surface Relief Structures Formed on Polymer Films Mixed with Diarylethenes

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Author(s)

    • UBUKATA Takashi
    • Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University
    • YAMAGUCHI Shuro
    • Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University
    • YOKOYAMA Yasushi
    • Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University

Abstract

Formation of photoinduced surface relief (PSR) was investigated using a poly(methyl methacrylate) film mixed with a series of symmetrical diarylethenes (DAEs). PSRs were formed on films with some DAEs having 2-benzothienyl groups by the patterned light irradiation (>350 nm) owing to material migration.

Journal

  • Chemistry Letters

    Chemistry Letters 36(10), 1224-1225, 2007-10-05

    The Chemical Society of Japan

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Codes

  • NII Article ID (NAID)
    10019961518
  • NII NACSIS-CAT ID (NCID)
    AA00603318
  • Text Lang
    ENG
  • Article Type
    Journal Article
  • ISSN
    03667022
  • DOI
    10.1246/cl.2007.1224
  • Data Source
    CJP  CJPref  J-STAGE 
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