Degradation Fate of Perfluorooctansulfonate (PFOS) and Perfluorooctanoic Acid (PFOA) by UV irradiation

• Yamada Shingo

  Department of Chemical Engineering, Graduate School of Engineering, Tokyo University of Agriculture & Technology

• Naito Yuta

  Department of Chemical Engineering, Graduate School of Engineering, Tokyo University of Agriculture & Technology

• Yamamoto Takashi

  Research Center for Material Cycles and Waste Management, National Institute for Environmental Studies

• Noma Yukio

  Research Center for Material Cycles and Waste Management, National Institute for Environmental Studies

• Hosomi Masaaki

  Department of Chemical Engineering, Graduate School of Engineering, Tokyo University of Agriculture & Technology

Bibliographic Information

Other Title

• ペルフルオロオクタンスルホン酸（ＰＦＯＳ）およびペルフルオロオクタン酸（ＰＦＯＡ）の紫外線分解処理挙動
• ペルフルオロオクタンスルホンサン PFOS オヨビ ペルフルオロオクタンサン PFOA ノ シガイセン ブンカイ ショリ キョドウ

Abstract

Perfluorooctanesulfonate (PFOS) and perfluorooctanoic acid (PFOA), persistent organic pollutants, were photodegraded by ultra-violet light irradiation in water, alkaline 2-propanol (IPA), water including H₂O₂ and water including both H₂O₂ and Fe²⁺, and the photodegradability in each condition was compared. F⁻ and SO₄²⁻ were generated with the PFOS decomposition and F⁻ was generated with the PFOA decomposition. The degradation ratio of PFOS was lower than that of PFOA in each condition. The photodegradability of PFOS and PFOA depended on the sample condition. Effective degradation was observed in alkaline IPA for PFOS, and in water for PFOA. Added H₂O₂ increased the photodegradability of PFOS. With the photo-Fenton reaction, although the degradation ratio of PFOA reached to 100%, that of PFOS was only 28.6%.The C–F bond dissociation in PFOA molecular progressed slowly in water, however the process was accelerated under photo-Fenton condition. In PFOS, on the other hand, C–F bond dissociation was suppressed to progress under photo-Fenton condition.

Journal

• KAGAKU KOGAKU RONBUNSHU

  KAGAKU KOGAKU RONBUNSHU 34 (3), 410-414, 2008

  The Society of Chemical Engineers, Japan

Keywords

• Fluoric surfactant
• Photodegradation
• Defluorination
• Accelerated decomposition
• Photo-Fenton reaction

Details

• CRID: 1390282679486368256
• NII Article ID: 10021111007
• NII Book ID: AN00037234
• DOI: 10.1252/kakoronbunshu.34.410
• COI: 1:CAS:528:DC%2BD1cXps1Citrs%3D
• ISSN: 13499203
• ISSN: 0386216X
• NDL BIB ID: 9520936
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9520936
• Web Site: http://www.jstage.jst.go.jp/article/kakoronbunshu/34/3/34_3_410/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed