Silylation of graphite oxide by dimethyloctylchlorosilane

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  • Matsuo Yoshiaki
    Graduate School of Engineering, Department of Materials Science and Chemistry, University of Hyogo
  • Matsumoto Yumiko
    Graduate School of Engineering, Department of Materials Science and Chemistry, University of Hyogo
  • Fukutsuka Tomokazu
    Graduate School of Human and Environmental Studies, Department of Interdisciplinary Environment, University of Kyoto
  • Sugie Yosohiro
    Graduate School of Engineering, Department of Materials Science and Chemistry, University of Hyogo

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Abstract

Graphite oxide was silylated by dimethyloctylchlorosilane under various conditions. Silylated graphite oxide was successfully obtained and the maximum silicon content reached 0.17 mol/graphite oxide unit when the butylamine/dimethy-loctylchlorosilane/ graphite oxide unit ratio was about 19/16/1. The above maximum silicon content was much smaller than that obtained for graphite oxide silylated by octyltrichlorosilane, probably because of the steric hindrance of methyl groups against oxygen containing groups on the surface of graphite oxide. At the same time, the smaller amount of butylamine was needed to scavenge the HC1 molecules formed as a byproduct, reflecting the smaller number of chlorine atom in the dimethy-loctylchlorosilane molecule.

Journal

  • TANSO

    TANSO 2008 (233), 115-118, 2008

    THE CARBON SOCIETY OF JAPAN

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