Surface Coating on Aluminum Flakes with Titanium Nitride Layer by Barrel-Sputtering Techniques
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- Akamaru Satoshi
- Hydrogen Isotope Research Center, University of Toyama
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- Honda Yuji
- Hydrogen Isotope Research Center, University of Toyama YOUTEC Co. Ltd.
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- Taguchi Akira
- Hydrogen Isotope Research Center, University of Toyama
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- Abe Takayuki
- Hydrogen Isotope Research Center, University of Toyama
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Flake-shaped fine particles were modified with a thin TiN layer by a hexagonal-barrel-sputtering technique. To determine the optimum sputtering conditions, TiN films were deposited on a glass substrate by the reactive sputtering technique by varying the values of N2 percentage, total pressure, radio-frequency (RF) power, and substrate temperature. From the analysis of XRD patterns, it was determined that a N2 percentage of 25%, a total pressure of 1.2 Pa, a RF power of 200 W, and room temperature were suitable for the preparation of TiN films. Under these optimized conditions, Al flakes were modified with a TiN by the barrel-sputtering technique. The results of optical microscopy, X-ray diffraction measurements, scanning electron microscopy, and energy-dispersive X-ray spectroscopy measurements revealed that the surface of each Al flake was successfully coated uniformly with a TiN layer.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 49 (7), 1638-1643, 2008
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204249181440
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- NII論文ID
- 10021148464
- 130004454044
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 9555735
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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