Rutile-Type TiO<sub>2</sub> Thin Films Quasi-Epitaxial Grown by Sputter Deposition

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  • Takao Hiroki
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
  • Miyajima Hidekazu
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
  • Mouri Kengo
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
  • Miyoshi Toru
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
  • Arita Makoto
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
  • Masuda Masataka
    Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University

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Other Title
  • スパッタ成膜法により準整合成長させたルチル型酸化チタン薄膜の光触媒性
  • スパッタ セイマクホウ ニ ヨリ ジュンセイゴウ セイチョウサセタ ルチルガタ サンカ チタン ハクマク ノ ヒカリ ショクバイセイ

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Abstract

  Titanium dioxide (TiO2) has been known as a photocatalyst. It is generally said the photocatalytic activity of anatase phase is superior to that of rutile phase despite the difference in the conditions of preparation for these two phases. We prepared anatase and rutile thin films under the same deposition conditions by reactive magnetron sputtering with Quasi-Epitaxial Growth (QEG) and discussed the relationship between the photocatalitic activity and the conditions of film deposition.<br>    An excellent photocatalytic performance was obtained for the rutile thin film prepared with QEG. With UV light illumination, QEG rutile exhibited a 0° contact angle with water as well as anatase and had better photo-decomposition activity than anatase. The photocatalytic activity of TiO2 thin films is strongly affected by deposition conditions.<br>

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