スパッタプラズマ中の高エネルギー粒子計測と制御 Measurement and Control of High Energy Particles in Sputter Plasma

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著者

    • 豊田 浩孝 TOYODA Hirotaka
    • 名古屋大学大学院工学研究科電子情報システム専攻 Department of Electrical Engineering and Computer Science, Nagoya University

抄録

  Measurement and control of high-energy Ar species in the magnetron plasma source is discussed. From energy distribution measurement of Ar<sup>+</sup> in the plasma, existence of high-energy Ar atoms in the magnetron plasma source is confirmed. It is concluded that collision of high-energy Ar atom with background thermal Ar atom is the dominant ionization mechanism for the production of high-energy Ar<sup>+</sup>. Based on this ionization mechanism, a Monte Carlo code is developed to simulate the Ar<sup>+</sup> energy distribution and the results are in good agreement with the experimental ones. A new technique to suppress high-energy Ar species i.e., VHF-DC superimposed magnetron sputter source, is proposed. Compared with conventional magnetron sputter sources, this new sputter source shows lower Ar energy, which is consistent with the simulation result. The VHF-DC superimposed magnetron plasma is successfully applied to the deposition of magnetic multilayer films with very thin (<1 nm) layer thickness and good magnetic anisotropy.<br>

収録刊行物

  • 真空

    真空 51(4), 258-263, 2008-04-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021157266
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    18822398
  • NDL 記事登録ID
    9501319
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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