Encapsulated Production System and its Application to Semiconductor Surface and Interface

• HARA Shiro

  Nanoelectronics Research Institute, AIST

Bibliographic Information

Other Title

• 局所クリーン化リサーチシステムと半導体表面・界面への応用
• キョクショ クリーンカ リサーチ システム ト ハンドウタイ ヒョウメン カイメン エノ オウヨウ

Abstract

We developed an Encapsulated Production System (EPS) composed of the human space and the product space. The product space is isolated from the human space in protection from penetration of particle and gas in the human space. Concentrations of oxygen, particle, and dissolved oxygen in solutions in the product space are of 5 orders of magnitude lower than those in atmosphere. As an experimental application of the system to the control of semiconductor surface and interface, we formed Schottky barrier diodes of Al/Si(111) interface in the EPS system and investigated diode leakage currents. It was found that electrically-ideal interfaces with no leakage current and no fluctuation of Schottky barrier heights were formed in the system.

Journal

• Hyomen Kagaku

  Hyomen Kagaku 29 (6), 375-381, 2008

  The Surface Science Society of Japan

Keywords

• EPS
• local clean
• productivity
• Schottky barrier
• dissolved oxygen

Details

• CRID: 1390001206458469120
• NII Article ID: 10021166439
• NII Book ID: AN00334149
• DOI: 10.1380/jsssj.29.375
• ISSN: 18814743
• ISSN: 03885321
• NDL BIB ID: 9545828
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9545828
• Web Site: http://www.jstage.jst.go.jp/article/jsssj/29/6/29_6_375/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed