ＰＥＣＶＤプロセスにおける生成ダスト微粒子のための小型レーザ光散乱モニタリング装置の開発

DOI Web Site 参考文献12件

書誌事項

タイトル別名
  • Development of a Compact Laser Light Scattering Monitoring Device for Dust Particles Generated during PECVD Process
  • PECVD プロセス ニ オケル セイセイ ダスト ビリュウシ ノ タメノ コガタ レーザコウ サンラン モニタリング ソウチ ノ カイハツ

この論文をさがす

抄録

Generation and deposition of dust particles in plasma processes for thin film preparation often causes serious problems leading to yield reduction. A device capable of conveniently measuring the properties of particles suspended in plasma has therefore been needed. In the present work, a compact particle monitoring device based on light scattering is developed, and its performance is examined. This device irradiates suspended particles with laser light consisting of two different wavelengths, and determines the particle diameter from the intensity of scattered light. Preliminary experiments using monodisperse latex particles dispersed in water indicated that the relationship between the scattered light intensity and particle diameter was consistent with that predicted by the light scattering theory. The device was then applied to a plasma enhanced CVD chamber in which SiH4/H2 plasma is formed to fabricate Si thin film. As a result, particles generated and suspended in the plasma could be detected when the amount of particles were sufficient depending on particle size. The particle size determined by the monitoring device was in the range between 0.2 and 0.3 μm. This size was in satisfactory agreement with the size of the particles deposited on the film.

収録刊行物

参考文献 (12)*注記

もっと見る

関連プロジェクト

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ