Chemistry of photolithographic imaging materials based on the chemical amplification concept

• MOON Seong-Yun

  Department of Chemical Engineering, Hanyang University

• KIM Jong-Man

  Department of Chemical Engineering, Hanyang University

Journal

• Journal of photochemistry and photobiology. C, Photochemistry reviews

  Journal of photochemistry and photobiology. C, Photochemistry reviews 8 (4), 157-173, 2007-12-01

Keywords

• Photolithography
• Chemical amplification
• Photoacid generator
• Photoresist

Details

• CRID: 1574231875317374080
• NII Article ID: 10021992943
• NII Book ID: AA11467302
• ISSN: 13895567
• Text Lang: en
• Data Source:
  • CiNii Articles