Generalized Model of Oxidation Mechanism at HfO_2/Si Interface with Post-Deposition Annealing

• SHIMIZU Haruka

  Department of Materials Science, School of Engineering, The University of Tokyo

• KITA Koji

  Department of Materials Science, School of Engineering, The University of Tokyo

• KYUNO Kentaro

  Department of Materials Science, School of Engineering, The University of Tokyo

• TORIUMI Akira

  Department of Materials Science, School of Engineering, The University of Tokyo

収録刊行物

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 2004 796-797, 2004-09-15

詳細情報

• CRID: 1570572700672337280
• NII論文ID: 10022540167
• NII書誌ID: AA10777858
• 本文言語コード: en
• データソース種別:
  • CiNii Articles