Precise Thermal Characterization of Confined Nanocrystalline Silicon By a 3ω Method

• KIHARA Takashi

  Research & Development Headquarters, Yamatake Corporation

• HARADA Toshihiro

  Research & Development Headquarters, Yamatake Corporation

• KOSHIDA Nobuyoshi

  Department of Electrical and Electronic Engineering, Faculty of Technology, Tokyo University of Agriculture and Technology

収録刊行物

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 2004 910-911, 2004-09-15

詳細情報

• CRID: 1572824500485916800
• NII論文ID: 10022540577
• NII書誌ID: AA10777858
• 本文言語コード: en
• データソース種別:
  • CiNii Articles