Microscopic Effect of Nitrogen Doping on Dielectric Constant of Hf-silicate

• MOMIDA Hiroyoshi

  Institute of Industrial Science, University of Tokyo

• HAMADA Tomoyuki

  Institute of Industrial Science, University of Tokyo

• YAMAMOTO Takenori

  AdvanceSoft Corporation

• UDA Tsuyoshi

  AdvanceSoft Corporation

• UMEZAWA Naoto

  National Institute for Materials Science

• SHIRAISHI Kenji

  Institute of Physics, University of Tsukuba

• CHIKYOW Toyohiro

  National Institute for Materials Science

• OHNO Takahisa

  National Institute for Materials Science

Journal

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 2005 488-489, 2005-09-13

Details

• CRID: 1572824500485881344
• NII Article ID: 10022542324
• NII Book ID: AA10777858
• Text Lang: en
• Data Source:
  • CiNii Articles