Novel inorganic pH-insensitive membrane prepared by post N_2O plasma treatment on conventional Si_3N_4/SiO_2 stack layer for REFET application

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Author(s)

    • WANG Ti-Chuan
    • Department of Electronic Engineering, Chang Gung University
    • LU Tseng-Fu
    • Department of Electronic Engineering, Chang Gung University
    • CHIN Chi-Hang
    • Department of Electronic Engineering, Chang Gung University
    • LUE Cheng-En
    • Department of Electronic Engineering, Chang Gung University
    • FANG Yu-Ching
    • Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
    • HSU Li
    • Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
    • WANG Hui-Chun
    • Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
    • LAI Chao-Sung
    • Department of Electronic Engineering, Chang Gung University

Journal

  • Extended abstracts of the ... Conference on Solid State Devices and Materials

    Extended abstracts of the ... Conference on Solid State Devices and Materials 2007, 678-679, 2007-09-19

References:  5

Codes

  • NII Article ID (NAID)
    10022550209
  • NII NACSIS-CAT ID (NCID)
    AA10777858
  • Text Lang
    ENG
  • Article Type
    SHO
  • Data Source
    CJP 
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