Novel inorganic pH-insensitive membrane prepared by post N_2O plasma treatment on conventional Si_3N_4/SiO_2 stack layer for REFET application
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- WANG Ti-Chuan
- Department of Electronic Engineering, Chang Gung University
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- LU Tseng-Fu
- Department of Electronic Engineering, Chang Gung University
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- CHIN Chi-Hang
- Department of Electronic Engineering, Chang Gung University
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- LUE Cheng-En
- Department of Electronic Engineering, Chang Gung University
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- YANG Chia-Ming
- Department of Electronic Engineering, Chang Gung University
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- FANG Yu-Ching
- Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
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- HSU Li
- Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
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- WANG Hui-Chun
- Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division
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- LAI Chao-Sung
- Department of Electronic Engineering, Chang Gung University
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2007 678-679, 2007-09-19
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- CRID
- 1571417125612057344
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- NII論文ID
- 10022550209
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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