Electrical Resistivity and Mossbauer Studies for the Structural Relaxation Process in Pd-Cu-Ni-P Glasses

• Haruyama Osami

  Department of Physics, Faculty of Science and Technology, Tokyo University of Science

• Kimura Hisamichi M.

  Institute for Materials Research, Tohoku University

• Nishiyama Nobuyuki

  Inoue Supercooled Glass Project, ERATO, Japan Science and Technology Corporation

• Inoue Akihisa

  Institute for Materials Research, Tohoku University

• Arai Juichiro

  Department of Physics, Faculty of Science and Technology, Tokyo University of Science

書誌事項

タイトル別名

• Electrical Resistivity and Mössbauer Studies for the Structural Relaxation Process in Pd-Cu-Ni-P Glasses
• Electrical Resistivity and Mössbauer Studies for the Structural Relaxation Process in Pd-Cu-Ni-P Glasses

抄録

The structural relaxation process in several Pd–Cu–Ni–P glasses was investigated by the electrical resistivity and the Mössbauer experiments. The change in the resistivity, ρ(300), and the corresponding slope, α(300)=(dρ⁄dT)₃₀₀, at room temperature was measured after a given heat treatment. The change in ρ(300) with isochronal annealing below the glass transition temperature (≈572 K), starting from room temperature, demonstrated that the ρ(300) increased with temperature and decreased beyond 550 K. The isothermal annealing at 570 K exhibited that the ρ(300) showed an increase, about 1%, during an initial annealing stage for 3.0×10² s and remained almost constant up to 6.0×10³ s, and hereafter monotonously decreased. The change in α(300) showed an opposite sign to that in ρ(300). The reversible change in ρ(300) due to isochronal annealing was observed in the heat treatment repeated between 350 and 550 K. The Mössbauer spectroscopy experiments were performed at room temperature to investigate the local structure change due to structural relaxation. The isomer shift and the quadrupole splitting for an annealed sample decreased in comparison with that of an as-quenched sample. Based on these results, the structural relaxation process and the structure change were discussed within the framework of the free volume model.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 43 (8), 1931-1936, 2002

  公益社団法人 日本金属学会

キーワード

• structural relaxation
• electrical resistivity
• weak localization
• Mössbauer spectroscopy
• free volume model

詳細情報

• CRID: 1390001204246703104
• NII論文ID: 10023890815
• NII論文ID: 30018849496
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.43.1931
• COI: 1:CAS:528:DC%2BD38Xnt1egsrk%3D
• ISSN: 13475320
• ISSN: 13459678
• NDL書誌ID: 6277123
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6277123
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/43/8/43_8_1931/_pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可