Difference in reaction schemes in photolysis of triphenylsulfonium salts between 248nm and dry/wet 193nm resists

• Yoshinori Matsui

• Hidekazu Sugawara

• Shu Seki

Bibliographic Information

Other Title

• Difference in reaction schemes in photolysis of triphenylsulfonium salts between 248nm and dry wet 193nm resists

Journal

• Applied physics express : APEX

  Applied physics express : APEX 1 (3), 2008-03

  Tokyo : Japan Society of Applied Physics

Details

• CRID: 1521980705571158144
• NII Article ID: 10025079690
• NII Book ID: AA12295133
• ISSN: 18820778
• NDL BIB ID: 9441662
• Web Site: http://id.ndl.go.jp/bib/9441662
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9441662
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles