Adsorption of 1-Decyl-3-methylimidazolium Bromide and Solvation Structure of Bromide at the Air/Water Interface
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- ARATONO Makoto
- Department of Chemistry, Faculty of Sciences, Kyushu University
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- SHIMAMOTO Kei
- Department of Chemistry, Faculty of Sciences, Kyushu University
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- ONOHARA Asuka
- Department of Chemistry, Faculty of Sciences, Kyushu University
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- MURAKAMI Daiki
- Department of Chemistry, Faculty of Sciences, Kyushu University
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- TANIDA Hajime
- Experimental Facilities Division, Japan Synchrotron Radiation Research Institute
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- WATANABE Iwao
- Department of Chemistry, Graduate School of Science, Osaka Prefecture University
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- OZEKI Toru
- Department of Natural Sciences, Hyogo University of Teacher Education
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- MATSUBARA Hiroki
- Department of Chemistry, Faculty of Sciences, Kyushu University
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- TAKIUE Takanori
- Department of Chemistry, Faculty of Sciences, Kyushu University
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The adsorbed film of 1-decyl-3-methylimidazolium bromide (DeMIMB) at the air/water interface was investigated employing the surface tension measurement and the x-ray absorption fine structure method under the total reflection condition (TRXAFS). From the surface tension measurement, the surface excess concentrations of ions were determined. From the XAFS measurement, two solvation states of bromide ion were found in the adsorbed film, which were assigned to be “free-Br” and “bound-Br”. The hydration number of the former was estimated to be 6 while that of the latter was estimated to be 4. The results based on the XAFS analysis provided significant information on the formation of domains in the adsorbed film; the most conceivable situation is that the adsorbed molecules are definitely not homogeneously dispersed, but domains (islands or clusters) are dispersed in the adsorbed film. A regular and rather tight stacking of immidazolium rings may be formed in the domains.
収録刊行物
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- Analytical Sciences
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Analytical Sciences 24 (10), 1279-1283, 2008
社団法人 日本分析化学会
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詳細情報 詳細情報について
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- CRID
- 1390001204257702528
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- NII論文ID
- 10025207146
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- NII書誌ID
- AA10500785
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- ISSN
- 13482246
- 09106340
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- NDL書誌ID
- 9667284
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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