Numerical Simulation of an RF Inductively Coupled Plasma for Functional Enhancement by Seeding Vaporized Alkali Metal

• Nishiyama, H.

• Shigeta, M.

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学術論文 (Article)

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収録刊行物

• The European physical journal. Applied physics : EPJ

  The European physical journal. Applied physics : EPJ 18 (2), 125-133, 2002

  EDP Sciences

詳細情報

• CRID: 1050282677735312256
• NII論文ID: 10025476978
• ISSN: 12860042
• HANDLE: 10097/47910
• Web Site: https://tohoku.repo.nii.ac.jp/records/47452
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles