Fabrication of the finestructured alumina materials with nanoimprint method

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  • KIM Hong Dae
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • NAKAYAMA Tadachika
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • YOSHIMURA Jun
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • IMAKI Kazuyoshi
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • YOSHIMURA Takeshi
    Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University
  • SUEMATSU Hisayuki
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • SUZUKI Tsuneo
    Extreme Energy-Density Research Institute, Nagaoka University of Technology
  • NIIHARA Koichi
    Extreme Energy-Density Research Institute, Nagaoka University of Technology

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Abstract

Nanoimprint lithography (NIL), is recognized as one of the candidates for next generation nanolithography. Usually nanoimprint equipment is highly expensive because the nano-scale mold needs to be hardened with thermal and photonic treatment after casting. In this study, we attempted to fabricate finestructured alumina materials without using highly expensive equipment. This method is based on the idea that poly vinyl alcohol (PVA) is simply detached from silicon mold by peeling. The experiment process used PVA and alumina nano-size particle, mixed in water solution. The mixed solution was then put into a micro-scale Si-mold and hardened at room temperature. After hardening the PVA and alumina nano-size particle mixed solution was detached from the micro-scale Si-mold. Throughout burn-out and low-temperature sintering, we confirmed the fabrication of finestructured micrometer-size alumina with nano-size pores.

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