マイクロチップ電気泳動分析用の凸型鋳型ガラス基板の簡易作製

  • 呉 行正
    福井大学大学院工学研究科材料開発工学専攻
  • 後藤 聡志
    福井大学大学院工学研究科材料開発工学専攻
  • 内山 一美
    首都大学東京大学院都市環境化学環分子応用化学域

書誌事項

タイトル別名
  • Simple Fabrication of a Convex Glass Mold for Microchip Electrophoresis
  • マイクロチップ デンキ エイドウ ブンセキヨウ ノ トツガタ イガタ ガラス キバン ノ カンイ サクセイ

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抄録

The conventional photolithography-chemical wet-etching method for preparing a convex mold usually uses a metal-coated glass or silicon-wafer substrate, and thus produces a waste solution containing heavy metal such as chromium. In this work, a simple photolithography-chemical wet-etching method using a slide glass without a coating of metal was proposed to fabricate a convex mold for preparing a PDMS (polydimethylsiloxane) microchip. A photoresist was directly coated on a cleaned slide glass, and was prebaked for 90 s. After covering with a photo-mask, the coated slide glass was illuminated with UV-visible light, followed by development with a developing reagent. Then, the slide glass was etched in a 1 M HF/1 M NH4F solution for a certain time. Finally, the etched slide glass was cleaned with acetone for removing the remaining photoresist. A PDMS microchip with a cross microchannel was prepared using the convex mold. The microchip was used for the electrophoresis of two fluorescent dyes and fluorescent labeled protein A. The experimental results showed that the simple method without using a metal-coated substrate could be used for convex molds for preparing microchips.

収録刊行物

  • 分析化学

    分析化学 58 (10), 909-913, 2009

    公益社団法人 日本分析化学会

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