High-Rate Deposition of Amorphous SiC Films by Atmospheric Pressure Plasma Chemical Vapor Deposition (1st report)

• MORI Y.

収録刊行物

• J. of JSPE

  J. of JSPE 66 907-, 2000

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• CRID: 1571980075959589504
• NII論文ID: 10026237143
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