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- 赤塚 洋
- 東京工業大学原子炉工学研究所
書誌事項
- タイトル別名
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- Optical Emission Spectroscopy Measurement of Processing Plasmas
- ハッコウ ブンコウ ケイソク オ モチイタ プロセスプラズマ ノ シンダン
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The present paper reviews fundamentals of optical emission spectroscopy (OES) of plasmas and, in particular, its applications to processing plasmas. Collisional radiative model is described to understand the excitation kinetics and population distributions of excited states in order to examine the electron temperature and density. It is shown that corona equilibrium is often adopted as justifiable assumption of excitation kinetics for general processing plasmas. Two OES methods to understand molecular gas discharge plasmas are also reviewed. One of them is to determine vibrational or rotational temperatures of molecular gas discharge plasmas by OES measurement. The other is the actinometry measurement method to examine neutral radical density.
収録刊行物
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- 電気学会論文誌. A
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電気学会論文誌. A 130 (10), 892-898, 2010
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204598897280
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- NII論文ID
- 10026693330
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 10830908
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可