Effects of substrate plane on the growth of high quality AlN by hydride vapor phase epitaxy

• Jiejun Wu

• Kazuteru Okuura

• Hideto Miyake

Journal

• Applied physics express : APEX

  Applied physics express : APEX 2 (11), 111004-, 2009-11

  Tokyo : Japan Society of Applied Physics

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1520854805104900352
• NII Article ID: 10027011951
• NII Book ID: AA12295133
• ISSN: 18820778
• ISSN: 18820786
• DOI: 10.1143/apex.2.111004
• NDL BIB ID: 10447075
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10447075
• Web Site: http://stacks.iop.org/1882-0786/2/i=11/a=111004/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles